Electroplating of Conformal Electrodes for Vacuum Nanogap Tunnel Junction

Jangidze, L. and Tavkhelidze, A. and Blagidze, Y. and Taliashvili, Z. (2012) Electroplating of Conformal Electrodes for Vacuum Nanogap Tunnel Junction. J. Electrochem. Soc., 159 (7). D413-D417.

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In this study, we electroplate Cu electrode on Si substrate to realize a large-area vacuum nanogap for electron tunneling. We used cathode coating, cathode rotation, asymmetric current regime, and electrolyte temperature stabilization to obtain the regular geometry of the Cu electrode and reduce its internal tension. Subsequently, internal tension was altered to achieve the predefined surface curvature (concave or convex). For 12-mm diameter Ag/Cu electrode, we achieve the curvature of 40 nm/mm from the Ag side. Reduction of the electrode diameter to 3 mm allowed curvature as low as of 2.5 nm/mm. It also allowed fabrication of two conformal electrodes having a nanogap of less than 5 nm wide, over the area of 7 mm^2. Such electrodes can be used for efficient energy conversion and cooling in the mixed thermionic and thermotunneling regime.

Item Type: Article
Subjects: T Technology > T Technology (General)
Divisions: Faculties/Schools > School of Natural Sciences and Engineering
Depositing User: Professor Avtandil Tavkhelidze
Date Deposited: 05 May 2014 12:53
Last Modified: 02 Apr 2015 08:30
URI: http://eprints.iliauni.edu.ge/id/eprint/1397

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